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Atomic layer deposition (ALD) for tin whisker mitigation on Pb-free surfaces

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conference contribution
posted on 2016-07-20, 09:06 authored by Jing Wang, Mark Ashworth, Geoffrey Wilcox, Marko Pudas, Terho Kutilainen, Paul Collander, Jussi Hokka
Atomic layer deposition (ALD) for tin whisker mitigation on Pb-free surfaces

History

School

  • Aeronautical, Automotive, Chemical and Materials Engineering

Department

  • Materials

Published in

Electronic Materials and Processes for Space (EMPS) Workshops, EMPS-7

Citation

WANG, J. ... et al., 2016. Atomic layer deposition (ALD) for tin whisker mitigation on Pb-free surfaces. Presented at: Electronic Materials and Processes for Space (EMPS) Workshops, EMPS-7, University of Portsmouth, 13 - 14 April 2016.

Publisher

EMPS

Version

  • VoR (Version of Record)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/

Acceptance date

2016-02-10

Publication date

2016

Notes

This is a powerpoint presentation.

Publisher version

Language

  • en

Location

University of Portsmouth

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    Loughborough Publications

    Categories

    Keywords

    untaggedMaterials Engineering not elsewhere classified

    Licence

    CC BY-NC-ND 4.0

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