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Dynamical model for the formation of patterned deposits at receding contact lines
journal contribution
posted on 2014-07-28, 11:52 authored by Lubor Frastia, Andrew ArcherAndrew Archer, Uwe ThieleWe describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical
model based on a long-wave approximation predicts the deposition of irregular and regular line patterns
due to self-organized pinning-depinning cycles corresponding to a stick-slip motion of the contact line.
We analyze how the line pattern properties depend on the evaporation rate and solute concentration.
Funding
We acknowledge support by the EU via the ITN MULTIFLOW (PITN-GA-2008-214919).
History
School
- Science
Department
- Mathematical Sciences
Published in
PHYSICAL REVIEW LETTERSVolume
106Issue
7Pages
? - ? (4)Citation
FRASTIA, L. ARCHER, A.J. and THIELE, U., 2011. Dynamical model for the formation of patterned deposits at receding contact lines. Physical Review Letters, 106, 077801, 4pp.Publisher
© American Physical SocietyVersion
- VoR (Version of Record)
Publication date
2011ISSN
0031-9007Publisher version
Language
- en