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Surface activation of rigid and flexible substrates for thin film photovoltaics using atmospheric pressure plasma
conference contribution
posted on 2017-01-06, 14:01 authored by Fabiana Lisco, Alexander H. Shaw, Alec Wright, Felipe IzaFelipe Iza, Michael WallsMichael WallsReducing fabrication costs is a major driving
force in photovoltaic research. Atmospheric processes
such as spin coating, spraying or printing are being
developed to reduce the cost/Wp of CIGS, CZTS and
perovskite solar technologies. For all technologies,
surface cleaning and activation prior to thin film
deposition is required and for this vacuum based low
pressure plasma is a well-established technique.
However, a vacuum based surface pre-treatment is not
compatible with atmospheric deposition methods. We
show that atmospheric-pressure plasmas are highly
effective in activating the surface of substrates
commonly used in photovoltaic device fabrication and
demonstrate its effectiveness on both rigid and flexible
substrates. The effectiveness of using atmosphericpressure
plasmas to increase surface energy is
demonstrated using Water Contact Angle (WCA)
measurements and chemical changes are analysed using
X-ray Photoelectron Spectroscopy (XPS). Scanning
Electron Microscopy (SEM) images show no alteration
of the surface morphology of the substrates after the
plasma treatment.
Funding
The authors are grateful to UKERC for provision of funding through the EPSRC Supergen SuperSolar Hub.
History
School
- Mechanical, Electrical and Manufacturing Engineering
Published in
43rd IEEE Photovoltaics Specialists ConferencePages
2204 - 2209Citation
LISCO, F. ... et al., 2016. Surface activation of rigid and flexible substrates for thin film photovoltaics using atmospheric pressure plasma. IN: 43rd IEEE Photovoltaics Specialists Conference, Portland, OR, 5-10 June 2016, pp. 2204 - 2209.Publisher
© IEEEVersion
- VoR (Version of Record)
Publisher statement
This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/Acceptance date
2016-10-10Publication date
2016Notes
Closed access © 2016 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.ISBN
978-1-5090-2724-8Publisher version
Language
- en