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Electron transfer reactions in ternary systems on silica gel surfaces: evidence for radical cation diffusion

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posted on 28.10.2014 by Sian L. Williams, Iain Kirkpatrick, David Worrall
Electron transfer reactions have been studied between 9-anthracenecarboxylic acid co-adsorbed with perylene on silica gel surfaces employing azulene as a molecular shuttle in order to facilitate hole transfer. In this paper we present for the first time a ternary system that unambiguously demonstrates an appreciable mobility of radical cations on the silica gel surface. Rates of hole transfer from the 9-anthracenecarboxylic acid radical cation to perylene via azulene have been studied using diffuse reflectance laser flash photolysis spectroscopy. Azulene has been shown to enhance the rate of electron transfer in the ternary system, proving significant mobility of the azulene and its radical cation species on silica gel surfaces. The data shows that the azulene radical cation can diffuse at an appreciable rate on the silica gel surface.

History

School

  • Science

Department

  • Chemistry

Published in

PHOTOCHEMICAL & PHOTOBIOLOGICAL SCIENCES

Volume

9

Issue

7

Pages

937 - 941 (5)

Citation

WILLIAMS, S.L., KIRKPATRICK, I. and WORRALL, D.R., 2010. Electron transfer reactions in ternary systems on silica gel surfaces: evidence for radical cation diffusion. Photochemical and Photobiological Sciences, 9 (7), pp. 937 - 941.

Publisher

© Royal Society of Chemistry and Owner Societies

Version

AM (Accepted Manuscript)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/

Publication date

2010

Notes

This article was published in the journal, Photochemical and Photobiological Sciences [© Royal Society of Chemistry and Owner Societies]. The definitive version is available at: http://dx.doi.org/10.1039/c0pp00049c

ISSN

1474-905X

Language

en

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