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Micro- and submicrostructuring thin polymer films with two and three-beam single pulse laser interference lithography

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journal contribution
posted on 27.09.2017 by Ignacio Martin-Fabiani, Stephen Riedel, Daniel R. Rueda, Jan Siegel, Johannes Boneberg, Tiberio A. Ezquerra, Aurora Nogales
In this work we report the application of two and three-beam single pulse laser interference lithography to thin polymer films of poly(trimethylene terephthalate) (PTT). By irradiating the sample surface with temporary and spatially overlapped single pulses from two or three coherent beams and changing the angles of incidence, we have accomplished the fabrication of large-area polymer micro and submicrogratings as well as submicrometric cavities arranged in a hexagonal lattice. The characterization of the structures in real space by atomic force microscopy (AFM) and scanning electron microscopy (SEM) has allowed us to determine the formation mechanism of the microgratings to be based on different ablation regimes depending on the local fluence. Moreover, complementary characterization of the submicrometric cavities in reciprocal space by grazing incidence small-angle X-ray scattering (GISAXS) confirms the existence of large areas where two-dimensional order is present. The experiments presented in this work demonstrate the suitability of single pulse laser interference lithography for micro and submicrostructuring polymer films, opening up new possibilities for patterning and paving the way for potential applications where polymer structures are involved.

Funding

The authors acknowledge financial support from the MINECO (grants MAT2011-23455, MAT2012-33517, TEC2011-22422 and FPI BES-2010-030074). We thank A. Szymczyk and Z. Rosłaniec for providing PTT samples.

History

School

  • Aeronautical, Automotive, Chemical and Materials Engineering

Department

  • Materials

Published in

Langmuir

Volume

30

Issue

29

Pages

8973 - 8979

Citation

MARTIN-FABIANI, I. ... et al., 2014. Micro- and submicrostructuring thin polymer films with two and three-beam single pulse laser interference lithography. Langmuir, 30 (29), pp. 8973 - 8979.

Publisher

© American Chemical Society

Version

AM (Accepted Manuscript)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/

Acceptance date

07/07/2014

Publication date

2014

Notes

This article was published in the journal Langmuir [© American Chemical Society] and the definitive version is available at: https://doi.org/10.1021/la5021059

ISSN

0743-7463

eISSN

1520-5827

Language

en

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