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Three modes in a radio frequency atmospheric pressure glow discharge

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posted on 20.08.2009 by J.J. Shi, Xu-Tao Deng, R. Hall, J.D. Punnett, Michael G. Kong
Fundamentally not requiring a vacuum chamber, atmospheric pressure glow discharges (APGDs) offer an exciting prospect for a wide range of material processing applications. To characterize their operation and establish their operation range, a radio frequency (rf) APGD is studied experimentally with measurement of discharge voltage, current, dissipated plasma power and plasma impedance. Different from the current understanding that rf APGD are operative only in the abnormal glow mode, we show the presence of two additional modes namely the normal glow mode and the recovery mode. It is shown that all three modes are spatially uniform and possess key characteristics of a glow discharge. So rf APGD have a much wider operation range than previously believed. To provide further insights, we investigate the transition from the abnormal glow mode to the recovery mode. It is established that the cause responsible for the mode transition is sheath breakdown, a phenomenon that is known in low- and moderate-pressure glow discharges but has not been reported before for atmospheric-pressure glow discharges. Finally we demonstrate that plasma dynamics, hence plasma stability, in these three modes are influenced crucially by the impedance matching between the plasma rig and the power source.

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  • Mechanical, Electrical and Manufacturing Engineering

Citation

SHI, J.J. ... et al, 2003. Three modes in a radio frequency atmospheric pressure glow discharge. Journal of Applied Physics, 94(10), pp. 6303-6310.

Publisher

© American Institute of Physics

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VoR (Version of Record)

Publication date

2003

Notes

Copyright 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the authors and the American Institute of Physics. This article appeared in the Journal of Applied Physics and may be found at: http://link.aip.org/link/?JAPIAU/94/6303/1

ISSN

0021-8979

Language

en

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