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Correlating molecular precursor interactions with device performance in solution-processed Cu2ZnSn(S,Se)4 Thin-Film Solar Cells

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posted on 2025-02-27, 12:10 authored by Raphael Agbenyeke, Alice Sheppard, Jacques KenyonJacques Kenyon, Nada Benhaddou, Nicole Fleck, Valentina Corsetti, Mohammad A. Alkhalifah, Devandra Tiwari, Jake BowersJake Bowers, David J.Fermin

Research efforts aimed at improving the crystal quality of solution-processed Cu2ZnSn(S,Se)4 (CZTSSe) absorbers have largely employed delicate pre- and postprocessing strategies, such as multistep selenization, heat treatment in mixed chalcogen atmospheres, and multinary extrinsic doping that are often complex and difficult to reproduce. On the other hand, understanding and tuning chemical interactions in precursor inks prior to the thin-film deposition have received significantly less attention. Herein, we show for the first time how the complexation of metallic and chalcogen precursors in solution have a stark influence on the crystallization and optoelectronic quality of CZTSSe absorbers. By varying thiourea to metal cation ratios (TU/M) in dimethylformamide (DMF) and isopropyl alcohol (IPA)-based inks, we observed the formation of nanoscale metal-organic complexes and submicron size aggregates which play a key role in the morphology of the precursor layers obtained by spin-coating and drying steps. We also identify the primary cations in the complexation and assembling processes in solution. The morphology of the precursor film, in turn, has an important effect on grain growth and film absorber structure after the reactive annealing in the presence of Se. Finally, we establish a link between metal complexes in precursor solutions and device performance, with power conversion efficiency increasing from approximately 2 to 8% depending on the TU/M and Cu/(Zn + Sn) ratios.

History

School

  • Mechanical, Electrical and Manufacturing Engineering

Published in

ACS Applied Materials and Interfaces

Volume

16

Issue

27

Pages

35315 - 35322

Publisher

American Chemical Society

Version

  • VoR (Version of Record)

Rights holder

© The Authors

Publisher statement

This publication is licensed under CC-BY 4.0

Acceptance date

2024-06-14

Publication date

2024-06-27

Copyright date

2024

ISSN

1944-8244

eISSN

1944-8252

Language

  • en

Depositor

Dr Jake Bowers. Deposit date: 13 August 2024

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