Defect-induced doping and chemisorption of O2 in Se deficient GaSe monolayers
Owing to their atomically thin nature, structural defects in two dimensional materials often play a dominating role in their electronic and optical properties. Here, we grow epitaxial GaSe monolayers on graphene/SiC by molecular beam epitaxy and characterise the layers by in situ scanning tunnelling microscopy and angle-resolved photoemission spectroscopy extracted from k-resolved photoemission electron microscopy mapping. We identify an electric dipole at the GaSe/graphene interface, with electrons accumulating on the GaSe, that cannot be compensated by p-type doping through the creation of defects formed by annealing in ultrahigh vacuum. Additionally, we demonstrate that both as-grown and defective GaSe layers are remarkably resilient to oxidation in a pure O2 environment, and chemisorption of O2 molecules on the surface can effectively electronically neutralise the doping in the layer. This work demonstrates the robust interlayer interaction in the GaSe/graphene van der Waals heterostructure and the role of defects on the doping for nanoelectronics.
Funding
EPI2SEM: EPItaxial growth and in-situ analysis of 2-dimensional SEMiconductors
Engineering and Physical Sciences Research Council
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History
School
- Science
Published in
2D MaterialsVolume
12Issue
1Publisher
IOP PublishingVersion
- VoR (Version of Record)
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© The Author(s)Publisher statement
Original content from this work may be used under the terms of the Creative Commons Attribution 4.0 licence. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.Acceptance date
2024-12-11Publication date
2024-12-20Copyright date
2024ISSN
2053-1583eISSN
2053-1583Publisher version
Language
- en