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Dynamical model for the formation of patterned deposits at receding contact lines

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journal contribution
posted on 28.07.2014, 11:52 by Lubor Frastia, Andrew ArcherAndrew Archer, Uwe Thiele
We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organized pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.

Funding

We acknowledge support by the EU via the ITN MULTIFLOW (PITN-GA-2008-214919).

History

School

  • Science

Department

  • Mathematical Sciences

Published in

PHYSICAL REVIEW LETTERS

Volume

106

Issue

7

Pages

? - ? (4)

Citation

FRASTIA, L. ARCHER, A.J. and THIELE, U., 2011. Dynamical model for the formation of patterned deposits at receding contact lines. Physical Review Letters, 106, 077801, 4pp.

Publisher

© American Physical Society

Version

VoR (Version of Record)

Publication date

2011

ISSN

0031-9007

Language

en

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Keywords

Exports