Dynamical model for the formation of patterned deposits at receding contact lines
journal contributionposted on 28.07.2014, 11:52 by Lubor Frastia, Andrew ArcherAndrew Archer, Uwe Thiele
We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organized pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.
We acknowledge support by the EU via the ITN MULTIFLOW (PITN-GA-2008-214919).
- Mathematical Sciences