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Electrocatalytic activity of CoFe2O4 thin films prepared by AACVD towards the oxygen evolution reaction in alkaline media

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posted on 05.01.2018, 11:31 authored by Jagdeep Sagu, Diana Mehta, Upul Wijayantha-Kahagala-Gamage
© 2017 The Authors The electrocatalytic behaviour of CoFe 2 O 4 thin films, prepared by aerosol-assisted chemical vapour deposition, towards the oxygen evolution reaction in an alkaline medium is reported. X-ray diffraction and SEM data show that the CoFe 2 O 4 thin films are phase pure and consist of dendrites 0.5–1 μm in diameter rising from the surface with heights ranging from 1 to 3 μm. The CoFe 2 O 4 thin films exhibited an overpotential of 490 mV at a current density of 10 mA cm − 2 , and a Tafel slope of 54.2 mV dec − 1 . Taking into account the electrochemically active surface area, the intrinsic activity of CoFe 2 O 4 was found to be 1.75 mA cm − 2 real at an overpotential of 490 mV. The CoFe 2 O 4 thin films were highly stable and were capable of maintaining catalytic activity for at least 12 h.

Funding

JS and KGUW acknowledge the support from UK EPSRC Joint University Industry Consortium for Energy (Materials) and Devices Hub (EP/R023662/1.

History

School

  • Science

Department

  • Chemistry

Published in

Electrochemistry Communications

Volume

87

Pages

1 - 4

Citation

SAGU, J.S., MEHTA, D. and WIJAYANTHA, K.G.U., 2018. Electrocatalytic activity of CoFe2O4 thin films prepared by AACVD towards the oxygen evolution reaction in alkaline media. Electrochemistry Communications, 87, pp. 1-4.

Publisher

© The Authors. Published by Elsevier

Version

VoR (Version of Record)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution 4.0 International (CC BY 4.0) licence. Full details of this licence are available at: http://creativecommons.org/licenses/ by/4.0/

Acceptance date

14/12/2017

Publication date

2017-12-15

Notes

This is an Open Access Article. It is published by Elsevier under the Creative Commons Attribution 4.0 Unported Licence (CC BY). Full details of this licence are available at: http://creativecommons.org/licenses/by/4.0/

ISSN

1388-2481

Language

en

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