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Formation of MoOx barrier layer under atmospheric based condition to control MoSe2 formation in CIGS thin film solar cell

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posted on 2018-10-15, 13:33 authored by Kam Hoe Ong, Agileswari Ramasamy, Panagiota Arnou, Bianca Maniscalco, Jake BowersJake Bowers, Chakrabarty Chandan Kumar, Marayati Bte Marsadek
As part of the device fabrication process, selenization step is required to crystallise the CIGS absorber layer. However, during high temperature selenization process, excessive formation of MoSe2can lead to delamination of the film and adverse effect on electrical properties of the solar cells. In this paper, a new method is proposed to form a Molybdenum Oxide (MoOx) barrier layer in between of the Mo back contact using plasma jet under atmospheric based conditions. The effect of MoOxcompound (MoO2and MoO3) towards the efficiency of the device is investigated. It has been proven that a thin layer of MoOxbarrier layer is able to control the formation of MoSe2effectively and provide a significant improvement in electrical properties of the devices. A power conversion efficiency of 5.24% with least efficiency variation across the champion device was achieved which demonstrates the importance of this methodology on small area devices.

Funding

This research was under the project entitled “Flexible solar photovoltaics for commercial roof tops and rural communities in Malaysia” which involves collaboration between Loughborough University, UK and Universiti Tenaga Nasional, Malaysia. The authors would like to acknowledge British council Newton Fund (Application ID 216006343) for funding this work.

History

School

  • Mechanical, Electrical and Manufacturing Engineering

Published in

Materials Technology

Volume

33

Issue

11

Pages

723 - 729

Citation

ONG, K.H. ... et al, 2018. Formation of MoOx barrier layer under atmospheric based condition to control MoSe2 formation in CIGS thin film solar cell. Materials Technology, 33 (11), pp.723-729.

Publisher

© Taylor & Francis

Version

  • AM (Accepted Manuscript)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/

Acceptance date

2018-07-15

Publication date

2018-07-25

Notes

This is an Accepted Manuscript of an article published by Taylor & Francis in Materials Technology on 25 July 2018, available online: http://www.tandfonline.com/10.1080/10667857.2018.1502512.

ISSN

1066-7857

eISSN

1753-5557

Language

  • en