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High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering

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journal contribution
posted on 04.03.2015, 12:11 authored by Fabiana Lisco, Piotr Kaminski, Ali AbbasAli Abbas, Jake BowersJake Bowers, Gianfranco ClaudioGianfranco Claudio, Maria Losurdo, Michael WallsMichael Walls
CadmiumSulphide (CdS) is an important n-type semiconductor widely used as a windowlayer in thin film photovoltaics Copper IndiumSelenide, Copper IndiumGallium (di)Selenide, Copper Zinc Tin Sulphide and Cadmium Telluride (CdTe). Cadmium Sulphide has been deposited using a number of techniques but these techniques can be slow (chemical bath deposition and Radio Frequency sputtering) or the uniformity and the control of thickness can be relatively difficult (close space sublimation). In this paper we report on the development of a process using pulsed Direct Current magnetron sputtering which allows nanometre control of thin film thickness using time only. The CdS thin films deposited in this process are highly uniformand smooth. They exhibit the preferred hexagonal structure at room temperature deposition and they have excellent optical properties. Importantly, the process is highly stable despite the use of a semi-insulating magnetron target. Moreover, the process is very fast. The deposition rate using 1.5 kW of power to a 6-inch circular magnetron was measured to be greater than 8 nm/s. This makes the process suitable for industrial deployment.

Funding

The authors are grateful to the Engineering and Physical Science Research Council (EP/J017361/1) for financial assistance under the Supergen SuperSolar Hub. They are also grateful to the Technology Strategy Board.

History

School

  • Mechanical, Electrical and Manufacturing Engineering

Research Unit

  • Centre for Renewable Energy Systems Technology (CREST)

Published in

THIN SOLID FILMS

Volume

574

Pages

43 - 51 (9)

Citation

LISCO, F. ... et al, 2015. High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering. Thin Solid Films, 574, pp.43-51.

Publisher

Elsevier (© the authors)

Version

VoR (Version of Record)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution 3.0 Unported (CC BY 3.0) licence. Full details of this licence are available at: http://creativecommons.org/licenses/by/3.0/

Acceptance date

20/11/2014

Publication date

2014-11-28

Copyright date

2015

Notes

This is an Open Access Article. It is published by Elsevier under the Creative Commons Attribution 3.0 Unported Licence (CC BY). Full details of this licence are available at: http://creativecommons.org/licenses/by/3.0/

ISSN

0040-6090

Language

en