posted on 2008-02-22, 16:12authored byFelipe Iza, Jeffrey A. Hopwood
Microplasma sources can be integrated into portable
devices for applications such as bio-microelectromechanical
system sterilization, small-scale materials processing, and microchemical
analysis systems. Portable operation, however, limits
the amount of power and vacuum levels that can be employed
in the plasma source. This paper describes the design and initial
characterization of a low-power microwave plasma source based
on a microstrip split-ring resonator that is capable of operating
at pressures from 0.05 torr (6.7 Pa) up to one atmosphere. The
plasma source’s microstrip resonator operates at 900 MHz and
presents a quality factor of Q = 335. Argon and air discharges
can be self-started with less than 3Win a relatively wide pressure
range. An ion density of 1.3 X 10(11) cm-3 in argon at 400 mtorr
(53.3 Pa) can be created using only 0.5W. Atmospheric discharges
can be sustained with 0.5 W in argon. This low power allows for
portable air-cooled operation. Continuous operation at atmospheric
pressure for 24 h in argon at 1 W shows no measurable
damage to the source.
History
School
Mechanical, Electrical and Manufacturing Engineering
Citation
IZA, F. and HOPWOOD, J.A., 2003. Low-power microwave plasma source based on a microstrip split-ring resonator. IEEE transactions on plasma science, 31 (4), pp. 782-787