Modeling of interference microscopy beyond the linear regime
journal contribution
posted on 2021-03-25, 11:42 authored by Matthew Thomas, Rong Su, Nikolay Nikolaev, Jeremy CouplandJeremy Coupland, Richard Leach© The Authors. Coherence scanning interferometry (CSI), a type of interference microscopy, has found broad applications in the advanced manufacturing industry, providing high-accuracy surface topography measurement. Enhancement of the metrological capability of CSI for complex surfaces, such as those featuring high slopes and spatial frequencies and high aspect-ratio structures, requires advances in modeling of CSI. However, current linear CSI models relying on approximate surface scattering models cannot accurately predict the instrument response for surfaces with complex geometries that cause multiple scattering. A boundary elements method is used as a rigorous scattering model to calculate the scattered field at a distant boundary. Then, the CSI signal is calculated by considering the holographic recording and reconstruction of the scattered field. Through this approach, the optical response of a CSI system can be predicted for almost any arbitrary surface geometry.
Funding
Metrology for precision and additive manufacturing
Engineering and Physical Sciences Research Council
Find out more...European Union’s Horizon 2020 Research and Innovation Programme (MNR4SCell, 734174)
History
School
- Mechanical, Electrical and Manufacturing Engineering
Published in
Optical EngineeringVolume
59Issue
3Publisher
SPIEVersion
- VoR (Version of Record)
Rights holder
© The authorsPublisher statement
This is an Open Access Article. It is published by SPIE under the Creative Commons Attribution 4.0 Unported Licence (CC BY). Full details of this licence are available at: http://creativecommons.org/licenses/by/4.0/Acceptance date
2020-03-13Publication date
2020-03-25Copyright date
2020ISSN
0091-3286eISSN
1560-2303Publisher version
Language
- en
Depositor
Prof Jeremy Coupland. Deposit date: 19 March 2021Article number
034110Usage metrics
Keywords
interference microscopyoptical modelingsurface scatteringcomputational electromagneticboundary element methodScience & TechnologyPhysical SciencesOpticsLATERAL RESOLUTIONLIGHTCALIBRATIONSCATTERINGSURFACESGRATINGSOptical PhysicsElectrical and Electronic EngineeringArtificial Intelligence and Image Processing
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