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Download fileOpposite correlations between cation disordering and amorphization resistance in spinels versus pyrochlores
journal contribution
posted on 2016-01-05, 11:12 authored by B.P. Uberuaga, Ming Tang, C. Jiang, James A. Valdez, Roger Smith, Yongqiang Wang, K.E. SickafusUnderstanding and predicting radiation damage evolution in complex materials is crucial for developing next-generation nuclear energy sources. Here, using a combination of ion beam irradiation, transmission electron microscopy and X-ray diffraction, we show that, contrary to
the behaviour observed in pyrochlores, the amorphization resistance of spinel compounds
correlates directly with the energy to disorder the structure. Using a combination of atomistic simulation techniques, we ascribe this behaviour to structural defects on the cation sublattice that are present in spinel but not in pyrochlore. Specifically, because of these structural defects, there are kinetic pathways for the relaxation of disorder in spinel that are absent in
pyrochlore. This leads to a direct correlation between amorphization resistance and disordering energetics in spinel, the opposite of that observed in pyrochlores. These results provide new insight into the origins of amorphization resistance in complex oxides beyond
fluorite derivatives.
History
School
- Science
Department
- Mathematical Sciences
Published in
Nature CommunicationsVolume
6Citation
UBERUAGA, B.P. ...et al., 2015. Opposite correlations between cation disordering and amorphization resistance in spinels versus pyrochlores. Nature Communications, 6, 8750.Publisher
© The Authors. Published by Nature Publishing GroupVersion
- VoR (Version of Record)
Publisher statement
This work is made available according to the conditions of the Creative Commons Attribution 4.0 International (CC BY 4.0) licence. Full details of this licence are available at: http://creativecommons.org/licenses/by/4.0/Acceptance date
2015-09-28Publication date
2015-10-29Notes
This is an Open Access Article. It is published by Nature Publishing Group under the Creative Commons Attribution 4.0 Unported Licence (CC BY). Full details of this licence are available at: http://creativecommons.org/licenses/by/4.0/ISSN
2041-1723eISSN
2041-1723Publisher version
Language
- en