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Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study

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journal contribution
posted on 16.09.2022, 12:56 authored by TCQ Noakes, R Valizadeh, AN Hannah, LB Jones, BL Militsyn, Sonal Mistry, Michael CropperMichael Cropper, A Rossall, JA Van den Berg

MEIS and XPS studies have been conducted for a range of oxygen plasma treated copper samples (and one treated with Ar plasma), as part of a study of the preparation of photocathode surfaces. This procedure was seen to remove hydrocarbon contamination, but left an oxide film whose thickness depended on the treatment conditions used. The film thickness was seen to increase with longer treatment time and higher RF power levels with behaviour characteristic of a diffusion limited process. Annealing led to a removal of the oxide layer by diffusion of oxygen into the bulk of the samples. This indicates that where the oxide layer is sufficiently thin, it should be possible to produce a surface with low enough oxygen content to have adequate conductivity and high enough surface escape probability to allow photoemission at UV wavelengths. Ar plasma treatment was seen to result in a very thin oxide film which could satisfy these requirements and thus might be preferable. Data from single crystal copper samples showed similar total oxygen content for all the surfaces analysed.

Funding

UKRI-STFC ASTeC

UK National Ion Beam Centre (under grant number NS/A000059/1)

History

School

  • Science

Department

  • Physics

Published in

Vacuum

Volume

205

Publisher

Elsevier

Version

VoR (Version of Record)

Rights holder

© The Authors

Publisher statement

This is an Open Access Article. It is published by Elsevier under the Creative Commons Attribution 4.0 International Licence (CC BY). Full details of this licence are available at: https://creativecommons.org/licenses/by/4.0/

Acceptance date

15/08/2022

Publication date

2022-08-19

Copyright date

2022

ISSN

0042-207X

eISSN

1879-2715

Language

en

Depositor

Dr Michael Cropper. Deposit date: 16 September 2022

Article number

111424