ao-55-15-4253.pdf (1.07 MB)
Download fileRefractive index determination by coherence scanning interferometry
journal contribution
posted on 2016-06-17, 13:53 authored by Hiro Yoshino, Piotr Kaminski, Roger Smith, Michael WallsMichael Walls, D. MansfieldCoherence scanning interferometry is established as a powerful noncontact, three-dimensional, metrology technique used to determine accurate surface roughness and topography measurements with subnanometer precision. The helical complex field (HCF) function is a topographically defined helix modulated by the electrical field reflectance, originally developed for the measurement of thin films. An approach to extend the capability of the HCF function to determine the spectral refractive index of a substrate or absorbing film has recently been proposed. In this paper, we confirm this new capability, demonstrating it on surfaces of silicon, gold, and a gold/ palladium alloy using silica and zirconia oxide thin films. These refractive index dispersion measurements show good agreement with those obtained by spectroscopic ellipsometry
Funding
Engineering and Physical Sciences Research Council (EPSRC) (EP/J017361/1, EP/M014297/1).
History
School
- Mechanical, Electrical and Manufacturing Engineering
Published in
Applied OpticsVolume
55Issue
15Pages
4253 - 4260Citation
YOSHINO, H. ... et al., 2016. Refractive index determination by coherence scanning interferometry. Applied Optics, 55 (15), pp. 4253 - 4260.Publisher
Optical Society of AmericaVersion
- VoR (Version of Record)
Publisher statement
This work is made available according to the conditions of the Creative Commons Attribution 4.0 International (CC BY 4.0) licence. Full details of this licence are available at: http://creativecommons.org/licenses/ by/4.0/Acceptance date
2016-03-21Publication date
2016Notes
Published by The Optical Society under the terms of the Creative Commons Attribution 4.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.ISSN
1559-128XPublisher version
Language
- en