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Spontaneous growth of bismuth nanowires on a sputter-deposited thin bismuth film

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journal contribution
posted on 03.06.2015, 10:39 by Andrew Caruana, Michael CropperMichael Cropper, Steven A. Stanley
Thin films of bismuth of thickness 100nm have been deposited onto Si(111) substrates held at 120°C using magnetron sputter deposition. The three-inch magnetrons were operated at DC powers between 30W and 50W to give deposition rates between 0.03 and 0.09nms-1. Examination of the surface of the thin films using scanning electron microscopy revealed nanowires of diameter 80-120nm and length between 3 and 16μm emerging from the film. An investigation of the effect of deposition rate found little influence on the nanowire diameter, but indicated that some longer nanowires could be found on the film deposited at the lowest rate. A 20nm film grown on glass at 110°C shows a nanowire with dimension of around 50nm. Using a relatively higher rate for the first 25nm followed by a lower rate to 100nm produced some very straight and regular nanorods.

History

School

  • Science

Department

  • Physics

Published in

Surface and Coatings Technology

Volume

271

Pages

8 - 12

Citation

CARUANA, A.J., CROPPER, M.D. and STANLEY, S.A., 2015. Spontaneous growth of bismuth nanowires on a sputter-deposited thin bismuth film. Surface and Coatings Technology, 271, pp. 8 - 12.

Publisher

© Elsevier B.V.

Version

AM (Accepted Manuscript)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/

Publication date

2015

Notes

This article belongs to a special issue of the journal from the 2014 International Conference on Surfaces, Coatings and Nanostructured Materials (NANOSMAT) - Europe.

ISSN

0257-8972

Other identifier

S0257897215001243

Language

en