Surfactant control of coffee ring formation in carbon nanotube suspensions
The coffee ring effect regularly occurs during the evaporation of colloidal droplets and is often undesirable. Here we show that adding a specific concentration of a surfactant can mitigate this effect. We have conducted experiments on aqueous suspensions of carbon nanotubes that were prepared with cationic surfactant dodecyltrimethylammonium bromide added at 0.2, 0.5, 1, 2, 5, and 10 times the critical micelle concentration. Colloidal droplets were deposited on candidate substrates for printed electronics with varying wetting characteristics: glass, polyethylene terephthalate, fluoroethylene propylene copolymer, and polydimethylsiloxane. Following drying, four pattern types were observed in the final deposits: dot-like, uniform, coffee ring deposits, and combined patterns (coffee ring with a dot-like central deposit). Evaporation occurred predominantly in constant contact radius mode for most pattern types, except for some cases that led to uniform deposits in which early stage receding of the contact line occurred. Image analysis and profilometry yielded deposit thicknesses, allowing us to identify a coffee ring subfeature in all uniform deposits and to infer the percentage coverage in all cases. Importantly, a critical surfactant concentration was identified for the generation of highly uniform deposits across all substrates. This concentration resulted in visually uniform deposits consisting of a coffee ring subfeature with a densely packed center, generated from two distinct evaporative phases.
Funding
Engineering and Physical Sciences Research Council (EPSRC)
History
School
- Design and Creative Arts
- Mechanical, Electrical and Manufacturing Engineering
- Science
Department
- Chemistry
- Design
- Mathematical Sciences
Published in
LangmuirVolume
39Issue
3Pages
929-941Publisher
American Chemical SocietyVersion
- VoR (Version of Record)
Rights holder
© The AuthorsPublisher statement
This is an Open Access Article. It is published by American Chemical Society under the Creative Commons Attribution 4.0 International Licence (CC BY). Full details of this licence are available at: https://creativecommons.org/licenses/by/4.0/Acceptance date
2022-12-07Publication date
2023-01-06Copyright date
2023ISSN
0743-7463eISSN
1520-5827Publisher version
Language
- en