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The extended growth of graphene oxide flakes using ethanol CVD

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journal contribution
posted on 14.08.2013, 09:04 by Jingfeng Huang, Melanie Larisika, Derrick W.H. Fam, Qiyuan He, Myra A. Nimmo, Christoph Nowak, Alfred I.Y. Tok
We report the extended growth of Graphene Oxide (GO) flakes using atmospheric pressure ethanol Chemical Vapor Deposition (CVD). GO was used to catalyze the deposition of carbon on substrate in the ethanol CVD with Ar and H2 as carrier gases. Raman, SEM, XPS 10 and AFM characterized the growth to be reduced GO (RGO) of <5 layers. This new grown RGO possesses lower defect density with larger and increased distribution of sp2 domains than chemically-reduced RGO. Furthermore this method without optimization reduces relative standard deviation of electrical conductivity between chips, from 80.5% to 16.5%, enabling RGO to be used in practical electronic devices.

Funding

The authors are grateful for the funding from the Institute for Sports Research (ISR) of Nanyang Technological University (NTU) and the International Graduate School Bio-Nano-Tech; 5 a joint program of University of Natural Resources and Life Sciences Vienna (BOKU), the Austrian Institute of Technology (AIT) and NTU.

History

School

  • Sport, Exercise and Health Sciences

Citation

HUANG, J. ... et al, 2013. The extended growth of graphene oxide flakes using ethanol CVD. Nanoscale, 5 (7), pp.2945-2951.

Publisher

RSC Publishing (journal © The Royal Society of Chemistry; article © the authors)

Version

SMUR (Submitted Manuscript Under Review)

Publication date

2013

Notes

This article is closed access until 3rd February 2014.

ISSN

2040-3364

eISSN

2040-3372

Language

en

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Keywords

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