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The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

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journal contribution
posted on 30.04.2015, 11:17 by Fabiana Lisco, Piotr Kaminski, Ali AbbasAli Abbas, Kevin BassKevin Bass, Jake BowersJake Bowers, Gianfranco ClaudioGianfranco Claudio, Maria Losurdo, Michael WallsMichael Walls
Cadmium sulphide (CdS) thin films were deposited by two different processes, chemical bath deposition (CBD), and pulsed DC magnetron sputtering (PDCMS) on fluorine doped-tin oxide coated glass to assess the potential advantages of the pulsed DC magnetron sputtering process. The structural, optical and morphological properties of films obtained by CBD and PDCMS were investigated using X-ray photoelectron spectroscopy, X-ray diffraction, scanning and transmission electron microscopy, spectroscopic ellipsometry and UV-Vis spectrophotometry. The as-grown films were studied and comparisons were drawn between their morphology, uniformity, crystallinity, and the deposition rate of the process. The highest crystallinity is observed for sputtered CdS thin films. The absorption in the visible wavelength increased for PDCMS CdS thin films, due to the higher density of the films. The band gap measured for the as-grown CBD-CdS is 2.38 eV compared to 2.34 eV for PDCMS-CdS, confirming the higher density of the sputtered thin film. The higher deposition rate for PDCMS is a significant advantage of this technique which has potential use for high rate and low cost manufacturing.

Funding

The authors are grateful to the Engineering and Physical Science Research Council (EPSRC) (EP/J017361/1) for financial assistance under the Supergen SuperSolar Hub. They are also grateful to the Technology Strategy Board.

History

School

  • Mechanical, Electrical and Manufacturing Engineering

Research Unit

  • Centre for Renewable Energy Systems Technology (CREST)

Published in

Thin Solid Films

Volume

582

Pages

323 - 327

Citation

LISCO, F. ... et al., 2015. The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering. Thin Solid Films, 582, pp. 323 - 327.

Publisher

© The Authors. Published by Elsevier B.V.

Version

VoR (Version of Record)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution 3.0 Unported (CC BY 3.0) licence. Full details of this licence are available at: http://creativecommons.org/licenses/by/3.0/

Publication date

2014-11-28

Notes

This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/3.0/)

ISSN

0040-6090

Other identifier

S0040609014012176

Language

en