posted on 2018-06-12, 08:27authored byMichael Cropper
Pulsed laser deposition has been used to prepare thin films of the high entropy alloy AlCrFeCoNiCu. The 35 nm films were deposited in ultra-high vacuum onto glass at room temperature and above and analysed using X-ray diffraction and X-ray photoelectron spectroscopy. Films deposited at room temperature exhibit a mix of FCC and BCC reflections, the FCC crystallites having size similar to the film thickness, but the BCC crystallites are larger. The intensity of the reflections from both crystal structures reduce with increasing deposition temperature, the fall in BCC commencing at lower temperature than the FCC associated with a reduction of the content of Al and Cu. X-ray photoelectron spectroscopy shows that the films deposited at room temperature are closer to stoichiometry than those at higher temperatures. An important feature of the X-ray photoelectron spectroscopy depth profiles is surface segregation, the outer 3 nm of the high entropy alloy films has higher concentration of Al and, to a lesser extent, Cr.
History
School
Science
Department
Physics
Published in
Applied Surface Science
Volume
455
Pages
153 - 159
Citation
CROPPER, M.D., 2018. Thin films of AlCrFeCoNiCu high-entropy alloy by pulsed laser deposition. Applied Surface Science, 455, pp.153-159.
This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/
Acceptance date
2018-05-22
Publication date
2018-05-23
Notes
This paper was accepted for publication in the journal Applied Surface Science and the definitive published version is available at https://doi.org/10.1016/j.apsusc.2018.05.172