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Tilt scanning interferometry: a numerical simulation benchmark for 3D metrology

journal contribution
posted on 2015-02-13, 16:06 authored by Gustavo E. Galizzi, Pablo RuizPablo Ruiz, Guillermo H. Kaufmann
Tilt scanning interferometry (TSI) is a novel experimental technique that allows the measurement of multicomponent displacement fields inside the volume of a sample. In this paper, we present a simulation model that allows for the evaluation of the speckle fields recorded in TSI when this technique is applied to the analysis of semitransparent scattering materials. The simulation is based on the convolution of the optical impulsive response of the optical system and the incident field amplitude. Different sections of the simulated imaging system are identified and the corresponding optical impulsive responses are determined. To evaluate the performance of the proposed model, a known internal displacement field as well as the illumination and detection strategies in a real TSI system are numerically simulated. Then, the corresponding depth-resolved out-of-plane and in-plane changes of phase are obtained by means of the data processing algorithm implemented in a TSI system.

History

School

  • Mechanical, Electrical and Manufacturing Engineering

Published in

APPLIED OPTICS

Volume

48

Issue

17

Pages

3184 - 3191 (8)

Citation

GALIZZI, G.E., RUIZ, P.D. and KAUFMANN, G.H., 2009. Tilt scanning interferometry: a numerical simulation benchmark for 3D metrology. Applied Optics, 48 (17), pp. 3184 - 3191.

Publisher

© Optical Society of America

Version

  • VoR (Version of Record)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/

Publication date

2009

Notes

This article is closed access.

ISSN

1559-128X

Language

  • en

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