Gate oxide failure in MOS devices
thesisposted on 2018-05-22, 08:56 authored by Liqin Dong
The thesis presents an experimental and theoretical investigation of gate oxide breakdown in MOS networks, with a particular emphasis on constant voltage overstress failure. It begins with a literature search on gate oxide failure mechanisms, particularly time-dependent dielectric breakdown, in MOS devices. The experimental procedure is then reported for the study of gate oxide breakdown under constant voltage stress. The experiments were carried out on MOSFETs and MOS capacitor structures, recording the characteristics of the devices before and after the stress. The effects of gate oxide breakdown in one of the transistors in an nMOS inverter were investigated and several parameters were found to have changed. A mathematical model for oxide breakdown, based on physical mechanisms, is proposed. Both electron and hole trapping occurred during the constant voltage stress. Breakdown appears to take place when the trapped hole density reach a critical value. PSPICE simulations were performed for the MOSFETs, nMOS inverter and CMOS logic circuits. Two models of MOSFET with gate oxide short were validated. A good agreement between experiments and simulations was achieved.
- Mechanical, Electrical and Manufacturing Engineering
Publisher© L. Dong
Publisher statementThis work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/
NotesA Master's Thesis. Submitted in partial fulfilment of the requirements for the award of Master of Philosophy at Loughborough University.