posted on 2017-10-25, 09:17authored byMartin I. Ridge
A technique is described for depositing thin films (≈ 200nm)
of visibly transparent, electrically conducting metal- and
metal alloy-oxides onto room temperature substrates of
either glass or plastic by the technique of high rate
reactive magnetron sputtering. [Continues.]
Funding
EEC. SERC. Camvac. Van Leer Research
Laboratories Ltd.
This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 2.5 Generic (CC BY-NC-ND 2.5) licence. Full details of this licence are available at: http://creativecommons.org/licenses/by-nc-nd/2.5/
Publication date
1984
Notes
A Doctoral Thesis. Submitted in partial fulfilment of the requirements for the award of Doctor of Philosophy at Loughborough University.